Residual Stress Evolution in Dielectric Thin Films Prepared from Poly(methylsilsesquioxane) Precursor
2002 ◽
Vol 203
(5-6)
◽
pp. 801-811
◽
Keyword(s):
2002 ◽
Vol 2002
(0)
◽
pp. 247-248
2013 ◽
Vol 378
◽
pp. 34-38
◽
2001 ◽
Vol 371
(1)
◽
pp. 397-402
◽
Keyword(s):